Handbook of physical vapor deposition (PVD) processing : film formation, adhesion, surface preparation and contamination control /

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Bibliographic Details
Main Author: Mattox, Donald M.
Format: Book
Language: English
Published: New Jersey : Noyes Publications, ©1998.
Subjects:
Notas Contenido:
  • Substrate ("real") surfaces and surface modification
  • The low-pressure gas and vacuum processing
  • The low-pressure plasma processing environment
  • Vacuum evaporation and vacuum deposition
  • Film characterization and some basic film properties

Valle/Complejo Salomia: Unknown

Holdings details from Valle/Complejo Salomia: Unknown
Call Number: R 671.735 M444h
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