Handbook of physical vapor deposition (PVD) processing : film formation, adhesion, surface preparation and contamination control /

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Bibliographic Details
Main Author: Mattox, Donald M.
Format: Book
Language: English
Published: New Jersey : Noyes Publications, ©1998.
Subjects:
Notas Contenido:
  • Substrate ("real") surfaces and surface modification
  • The low-pressure gas and vacuum processing
  • The low-pressure plasma processing environment
  • Vacuum evaporation and vacuum deposition
  • Film characterization and some basic film properties

MARC

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245 1 0 |a Handbook of physical vapor deposition (PVD) processing :  |b film formation, adhesion, surface preparation and contamination control /  |c by Donald M. Mattox. 
260 |a New Jersey :  |b Noyes Publications,  |c ©1998. 
300 |a xxvii, 917 páginas :  |b ilustraciones ;  |c 24 cm. 
500 |a Incluye índice 
505 2 |a Substrate ("real") surfaces and surface modification -- The low-pressure gas and vacuum processing -- The low-pressure plasma processing environment -- Vacuum evaporation and vacuum deposition -- Film characterization and some basic film properties 
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650 2 7 |a Materiales refractarios  |2 Armarc 
650 2 7 |a Tecnología del vacío  |2 Armarc 
653 |a PVD (Física) 
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