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Statistical analysis of multiple cracking phenomenon of a SiOx thin film on a polymer substrate.

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Bibliographic Details
Title: Statistical analysis of multiple cracking phenomenon of a SiOx thin film on a polymer substrate.
Authors: Yanaka, M., Tsukahara, Y., Okabe, T.
Source: Journal of Applied Physics; July 15 2001, Vol. 90 Issue 2, p713-719, 7p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 500774502
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Statistical analysis of multiple cracking phenomenon of a SiOx thin film on a polymer substrate.
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  Data: <searchLink fieldCode="AU" term="%22Yanaka%2C+M%2E%22">Yanaka, M.</searchLink><br /><searchLink fieldCode="AU" term="%22Tsukahara%2C+Y%2E%22">Tsukahara, Y.</searchLink><br /><searchLink fieldCode="AU" term="%22Okabe%2C+T%2E%22">Okabe, T.</searchLink>
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Applied+Physics%22">Journal of Applied Physics</searchLink>; July 15 2001, Vol. 90 Issue 2, p713-719, 7p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=500774502
RecordInfo BibRecord:
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    Identifiers:
      – Type: doi
        Value: 10.1063/1.1379355
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      – Code: eng
        Text: English
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        PageCount: 7
        StartPage: 713
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      – TitleFull: Statistical analysis of multiple cracking phenomenon of a SiOx thin film on a polymer substrate.
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          Name:
            NameFull: Yanaka, M.
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            NameFull: Tsukahara, Y.
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            NameFull: Okabe, T.
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            – D: 15
              M: 07
              Text: July 15 2001
              Type: published
              Y: 2001
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              Value: 90
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            – TitleFull: Journal of Applied Physics
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