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Feature Analysis and Modeling of 670 nm Laser Optical Endpoint Traces in Tungsten CMP.

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Title: Feature Analysis and Modeling of 670 nm Laser Optical Endpoint Traces in Tungsten CMP.
Authors: Mazzone, Giovanni1, Bano, Giuseppe2, Gianni, Davide Michele3, Castelletti, Luca1, Borsari, Silvia1
Source: IEEE Transactions on Semiconductor Manufacturing; Nov2013, Vol. 26 Issue 4, p542-548, 7p
Database: Applied Science & Technology Source
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  Availability: 0
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 91789775
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1109/TSM.2013.2271907
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      – Code: eng
        Text: English
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        PageCount: 7
        StartPage: 542
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      – TitleFull: Feature Analysis and Modeling of 670 nm Laser Optical Endpoint Traces in Tungsten CMP.
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            NameFull: Mazzone, Giovanni
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            NameFull: Bano, Giuseppe
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            NameFull: Gianni, Davide Michele
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            NameFull: Castelletti, Luca
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              Text: Nov2013
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              Y: 2013
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              Value: 26
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