Handbook of physical vapor deposition (PVD) processing : film formation, adhesion, surface preparation and contamination control /

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Bibliographic Details
Main Author: Mattox, Donald M.
Format: Book
Language: English
Published: New Jersey : Noyes Publications, ©1998.
Subjects:
Notas Contenido:
  • Substrate ("real") surfaces and surface modification
  • The low-pressure gas and vacuum processing
  • The low-pressure plasma processing environment
  • Vacuum evaporation and vacuum deposition
  • Film characterization and some basic film properties
Description
Item Description:Incluye índice
Physical Description:xxvii, 917 páginas : ilustraciones ; 24 cm.
ISBN:0815514220