Handbook of physical vapor deposition (PVD) processing : film formation, adhesion, surface preparation and contamination control /
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Bibliographic Details
| Main Author: |
Mattox, Donald M. |
| Format: |
Book
|
| Language: |
English |
| Published: |
New Jersey :
Noyes Publications,
©1998.
|
| Subjects: |
|
| Notas Contenido: |
- Substrate ("real") surfaces and surface modification
- The low-pressure gas and vacuum processing
- The low-pressure plasma processing environment
- Vacuum evaporation and vacuum deposition
- Film characterization and some basic film properties
|
